Lithography-Free Nanofilm Color Filters Composed of CMOS-Compatible Materials

doi:10.1109/LPT.2021.3086088

	Lithography-Free Nanofilm Color Filters Composed of CMOS-Compatible Materials
	Wenchao Qian 1; Yilin Wang 1; Song Zhang 1; Maowen Song 1; Yi Zou2 ; Ting Xu 1
	2021-07-01
发表期刊	IEEE PHOTONICS TECHNOLOGY LETTERS (IF:2.3[JCR-2023],2.2[5-Year])
ISSN	1041-1135
EISSN	1941-0174
卷号	33 期号:13 页码:672-675
发表状态	已发表
DOI	10.1109/LPT.2021.3086088
摘要	Nanostructures with the ability to efficiently generate colors in visible range attract lots of attention. Current plasmonic materials-based techniques always require complicated lithographic processes, which are expensive and severely limiting the production throughput. In this letter, we experimentally demonstrate a large-area silicon-based multilayer structure for color filtering. The designed lithography-free nanofilm color filters possess high transmission (>70%) and wide-angle tolerance (up to +/- 30 degrees) for both TE and TM polarizations. Our approach, featuring excellent performance together with CMOS compatible materials, steps forward towards practical applications such as image sensors and display devices.
关键词	Image color analysis Nonhomogeneous media Plasmons Electric fields Refractive index Performance evaluation Nanoscale devices Color filter thin film spectrum
URL	查看原文
收录类别	SCIE ; EI
语种	英语
WOS研究方向	Engineering ; Optics ; Physics
WOS类目	Engineering, Electrical & Electronic ; Optics ; Physics, Applied
WOS记录号	WOS:000663526500001
出版者	IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
原始文献类型	Article
来源库	IEEE
引用统计	正在获取...
文献类型	期刊论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/127561
专题	信息科学与技术学院信息科学与技术学院_PI研究组_邹毅组
作者单位	1.National Laboratory of Solid-State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Nanjing University, Nanjing, China 2.School of Information Science and Technology, ShanghaiTech University, Shanghai, China
推荐引用方式 GB/T 7714	Wenchao Qian,Yilin Wang,Song Zhang,et al. Lithography-Free Nanofilm Color Filters Composed of CMOS-Compatible Materials[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2021,33(13):672-675.
APA	Wenchao Qian,Yilin Wang,Song Zhang,Maowen Song,Yi Zou,&Ting Xu.(2021).Lithography-Free Nanofilm Color Filters Composed of CMOS-Compatible Materials.IEEE PHOTONICS TECHNOLOGY LETTERS,33(13),672-675.
MLA	Wenchao Qian,et al."Lithography-Free Nanofilm Color Filters Composed of CMOS-Compatible Materials".IEEE PHOTONICS TECHNOLOGY LETTERS 33.13(2021):672-675.