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Measurement of Inductance in Niobium Nitride Films for Single Flux Quantum Circuits
2020-10
发表期刊IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY (IF:1.7[JCR-2023],1.5[5-Year])
ISSN1051-8223
卷号30期号:7
发表状态已发表
DOI10.1109/TASC.2020.3016983
摘要

In recent years, rapid single flux quantum (RSFQ) circuits, which are promising for the development of high-speed digital electronics, have attracted widespread interest. Niobium nitride (NbN) films have also attracted significant attention for high-frequency applications in superconducting electronics because of their superior material parameters, including their high critical temperature Tc and large gap voltage Vg. To enable the development of all-NbN SFQ circuits, we have developed a fabrication process based on NbN junctions and inductors made of NbN strip lines. It is important to evaluate the inductance because it can affect the performance of an RSFQ circuit and is essential for the RSFQ design. We measured the inductance properties of both epitaxial and polycrystalline NbN strip lines using a superconducting quantum interference device modulation technique at 4.2 K and obtained the width dependence on the inductance of the NbN films. The penetration depth was then calculated from these measurements. The NbN inductance values were calculated numerically with respect to the penetration depth and were then compared with the measured values from the experiments. It was demonstrated that the differences between these values were within 5%. The results reported here will be useful for the design and fabrication of all-NbN RSFQ circuits.

关键词Inductance Strips SQUIDs Josephson junctions Fabrication Inductance measurement Wires Inductance Josephson junctions niobium nitride (NbN) films penetration depth
收录类别SCI ; SCIE
语种英语
资助项目Strategic Priority Research Program of the Chinese Academy of Sciences[XDA18010200]
WOS研究方向Engineering ; Physics
WOS类目Engineering, Electrical & Electronic ; Physics, Applied
WOS记录号WOS:000572134700001
出版者IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/123512
专题物质科学与技术学院_特聘教授组_王镇组
通讯作者Wang, Huiwu
作者单位
1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China;
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China;
3.Chinese Acad Sci, Ctr Excellence Superconducting Elect, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China;
4.Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China;
5.Shanghai Tech Univ, Shanghai 201210, Peoples R China
推荐引用方式
GB/T 7714
Tang, Xin,Wang, Huiwu,Shao, Yingyi,et al. Measurement of Inductance in Niobium Nitride Films for Single Flux Quantum Circuits[J]. IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY,2020,30(7).
APA Tang, Xin,Wang, Huiwu,Shao, Yingyi,Ren, Jie,Peng, Wei,&Wang, Zhen.(2020).Measurement of Inductance in Niobium Nitride Films for Single Flux Quantum Circuits.IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY,30(7).
MLA Tang, Xin,et al."Measurement of Inductance in Niobium Nitride Films for Single Flux Quantum Circuits".IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY 30.7(2020).
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