消息
×
loading..
Polarity control and fabrication of lateral polarity structures of III-nitride thin films and devices: progress and prospects
2020-11-25
发表期刊JOURNAL OF PHYSICS D-APPLIED PHYSICS (IF:3.1[JCR-2023],3.0[5-Year])
ISSN0022-3727
卷号53期号:48
发表状态已发表
DOI10.1088/1361-6463/abaf7b
摘要

Due to their non-centrosymmetric crystal orientation, wurtzite III-nitride crystals have two distinct orientations, i.e. III-polar and N-polar along thec-axis. Extensive effort has been devoted to polarity control and the characterization of III-nitride thin films. Both III-polar and N-polar films possess some unique features. By taking full advantage of both III and N-polar domains in a single structure, a lateral polarity structure (LPS), where III-polar and N-polar domains are grown side-by-side simultaneously on the wafer, has attracted great interest. In this review, recent progress in the design and fabrication of III-nitride LPS on various substrates is summarized. The structural, optical and electronic properties of III-nitride thin films incorporating LPS are discussed, with special attention paid to the interface between adjacent domains. Various techniques to qualitatively and quantitatively identify the polarity domains are provided, and their applications in optoelectronic and electronic devices including light-emitting-diodes, nonlinear frequency doubling waveguides, Schottky-barrier-diodes, etc, are intensively elaborated on. Finally, challenges related to the development of LPS-based devices and future perspectives are presented.

关键词wide bandgap materials III-nitride thin film lateral-polarity-structure optoelectronic devices electronic devices
收录类别SCI ; SCIE ; EI
资助项目National Key Research and Development Program of China[2016YFB0400802] ; National Natural Science Foundation of China[61974149][61704176] ; Key Research and Development Program of Zhejiang Province[2019C01080][2020C01145] ; Ningbo Innovation 2025 Major Project[2018B10088][2019B10121]
WOS研究方向Physics
WOS类目Physics, Applied
WOS记录号WOS:000574541900001
出版者IOP PUBLISHING LTD
引用统计
正在获取...
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/123474
专题物质科学与技术学院_硕士生
物质科学与技术学院_博士生
通讯作者Ye, Jichun
作者单位
1.Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China;
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China;
3.Univ Sci & Technol China, Sch Microelect, Hefei 230026, Anhui, Peoples R China;
4.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
推荐引用方式
GB/T 7714
Guo, Wei,Xu, Houqiang,Chen, Li,et al. Polarity control and fabrication of lateral polarity structures of III-nitride thin films and devices: progress and prospects[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2020,53(48).
APA Guo, Wei.,Xu, Houqiang.,Chen, Li.,Yu, Huabin.,Jiang, Jie'an.,...&Ye, Jichun.(2020).Polarity control and fabrication of lateral polarity structures of III-nitride thin films and devices: progress and prospects.JOURNAL OF PHYSICS D-APPLIED PHYSICS,53(48).
MLA Guo, Wei,et al."Polarity control and fabrication of lateral polarity structures of III-nitride thin films and devices: progress and prospects".JOURNAL OF PHYSICS D-APPLIED PHYSICS 53.48(2020).
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
个性服务
查看访问统计
谷歌学术
谷歌学术中相似的文章
[Guo, Wei]的文章
[Xu, Houqiang]的文章
[Chen, Li]的文章
百度学术
百度学术中相似的文章
[Guo, Wei]的文章
[Xu, Houqiang]的文章
[Chen, Li]的文章
必应学术
必应学术中相似的文章
[Guo, Wei]的文章
[Xu, Houqiang]的文章
[Chen, Li]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。